Nitrogen Trifluoride
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• Nitrogen trifluoride chamber clean is used to provide fluorion or nitrogen tri fluoride source.
• Nitrogen trifluoride is a colorless , stable, and toxic gas which has been used as a fluorine source for high energy chemical lasers, it is prepared by fluorine because it is easy to handling at ambient
  temperature.
• Nitrogen trifluoride also used in the fluorination of fluorocarbon olefins.
• In semiconductor fabrication, nitrogen trifluoride is usefull for plasma or cleaning of CVD reactors.
• NF3 is also a selective reagent for silicon dioxide etching.
• Nitrogen trifluoride used well with tungsten silicide, and the tungsten produced by CVD.
• NF3 has been considered as generally preferable substitute for sulfur hexafluoride or per fluoro carbons such as hexa fluoro ethane, the process utilization of the chemicals applied in plasma processes is typically below 20 %.
• So some of the PFCs and NF3 also escape into the atmosphere.
• Modern gas abatement systems can reduce such emissions.
• NF3 is a greenhouse gas, with a global warming potential 17,200 times greater than that of CO2 when compared over a 100 year period.
• Its GWP place it second only to SF6 in the group of Kyoto-recognised greenhouse gases,  NF3 also is not currently included in that grouping.
• It has an estimated atmospheric lifetime of 740 years, same as other work suggests a slightly shorter lifetime of 550 years.
• NF3 has a high GWP, for a long time which radiative forcing in the Earth's atmosphere to be small.
• Industrial applications of NF3 is routinely break it while in the past previously used regulated compounds such as SF6 and PFCs were often released.
• High-volume applications such as dram computer memory , the manufacturing of flat panel displays and the large-scale production of thin-film solar cells with insufficient ecological awareness continues to increase the emissions of NF3.
• Skin contact with NF3 is not hazardous, and it is minor irritant to mucous membranes and eyes.
• It is a irritant with a toxicity comparable with nitrogen oxides, and overexposure by inhalation causes the conversion of hemoglobin in blood to methemo globin, which can lead to the condition methemoglobinemia.
• Nitrogen trifluoride is brought to the attention of the CSWG because of increasing demand for this chemical in semiconductor industry, this projected to reach 3.2 million pounds.
• Nitrogen trifluoride (NF3) and fluorine (F2) product lines within the Electronics Division with annual sales of over $100 million and multiple hundred millions are invested.

• General information about nitrogen trifluoride.
• Nitrogen trifluoride: the new mandatory Kyoto Protocol greenhouse gas.
• NF3, the greenhouse gas missing from Kyoto.
• Nitrogen trifluoride introduction.
• Occupational health guidline for nitrogen trifluoride.
• Characterization of NF3 Chamber Cleans on Multiple
  CVD Platforms.

Properties & Application

• The main application of nitrogen trifluoride and that properties.
• Properties of Nitrogen trifluoride.
• Application and properties of nitrogen trifluoride.
• Physical Properties for Nitrogen Trifluoride.
• Properties, Uses, Storage, and Handling.
• Nitrogen trifluoride - Cleaning up in electronic applications.
• Nitrogen trifluoride uses.

Manufacturing process

• Synthesis of nitrogen trifluorides by direct fluorination of ammonium salts.
• Explosion at a Nitrogen Trifloride Gas Manufacturing Facility.
• Manufacturing procedure.
• Synthesis of nitrogen trifluoride in a glow discharge.

Report

• New approach to chemically induced silicon oxidation.
• Nitrogen Trifluoride Combustion and Suppression.
• Tool Perfluorocompound (PFC)
  Emissions Data Report.
• Atomic Fluorine Source for Chemical Lasers.
• Quenching Rate Constants of NF(a'A) by N2F4 , NF3, NF(X), SiF4, HNCO, and NCO at Room Temperature.
• Analysis of nitrigen trifluoride.
• A new instrument for thermal electron attachment at high temperature:NF3 and CH3Cl attachment rate constants up to 1100k.

Patent

• Purification of nitrogen trifluoride atmospheres.
• Nitrogen trifluoride production apparatus.
• Process for purifying nitrogen trifluoride gas.
• Removal of dinitrogen difluoride from nitrogen trifluoride.
• Process for the production of nitrogen trifluoride.
• NF3/H2 remote plasma process with high etch selectivity of PSG/BPSG over thermal oxide and low density surface defects.

Order the CD ROM Today

• Suppliers of Nitrogen trifluoride.
• Manufacturers of Nitrogen trifluoride.
• Selling leads of Nitrogen trifluoride.
• Exporters of Nitrogen trifluoride.
• Exporters of India.
• Suppliers of China.

Company profiles

• Company from Hangzhou.

Consultancy

• Consultancy from America.
• Consultancy from Chennai.
• Consultancy from Cornwall.
• Consultancy from USA
• Consultancy from London.
• Consultancy from Maryland.
• Consultancy from Minneapolis.

Products

• Product data sheet for nitrogen trifluoride.
• Technical data sheet for nitrogen trifluoride.
• Nitrogen trifluoride data sheet.
• Nitrogen trifluoride south africa product data sheet.
• Nitrogen trifluoride product data sheet.

MSDS

• MSDS for Nitrogen trifluoride.
• MSDS1 for Nitrogen trifluoride.
• Praxair safety sheet for Nitrogen trifluoride.
• Safety data sheet for Nitrogen trifluoride.
• Matheson tri gas msds sheet.
• Nitrogen trifluoride - safety data sheet
• Air liquide msds sheet for Nitrogen trifluoride.

Project

• Nitrogen Trifluoride-Based Fluoride- Volatility Separations Process: Initial Studies
• Remote plasma etching of silicon nitride and silicon dioxide
  using NF3/O2 gas mixtures.

Study

• Gas-phase chemistry of nitrogen trifluoride NF3: structure and stability of its Mþ–NF3 (M ¼ H, Li, Na, K) complexes.
• Life-Cycle Nitrogen Trifluoride
  Emissions from Photovoltaics.
• Life-Cycle Nitrogen Trifluoride
  Emissions from Photovoltaics.
• The ionization potential of NF3: a G3 computational study on the
  thermochemical properties of NFx and NF1x(X=1-3).
• Silicon etching in NF3/O2 remote microwave plasmas.
• Acute inhalation toxicology and proposed emergency exposure limits of nitrogen trifluoride.
• Modification of an NF3 flim by sub-excitation electrons.
• Study on fluorine containing mixtures in low pressure RF ICP plasma.
   

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