- Metalorganic compounds (jargon:
metalorganics, metallo-organics) are a class of chemical compounds that
contain metals and organic ligands.
- Precursors are one of the compounds
that participates in the chemical reaction that produces another
compound.
- Metal-organic (MO) chemicals or
precursors are used in the epitaxial growth of LED semiconductor
materials
- Metal-organic (MO) chemicals or
precursors provide the source of metallic elements such as gallium (Ga),
indium (In) and aluminum (Al).
- Development of metal organic
precursors made significant contribution to the field
of
semiconductor growth.
- Metal-organic (MO) chemicals
specifically designed for the MOVPE or CBE process,
have improved
gas-phase and surface decomposition, leading to very thin high quality
semiconductor films.
- The tremendous expansion of
metal-organic chemical vapor deposition process
(MOCVD) is accounted
for its ability to deposit at low temperature a wide variety of thin
film materials keeping advantages of the conventional CVD process. The
design and the selection of suitably tailored metal-organic precursors
is a fundamental key to develop successfully an MOCVD process.
- The incorporation efficiency (also
called reactor efficiency) of trimethylgallium (TMGa) and
trimethylaluminium (TMAl) precursors were calculated and then
compare
the ratio of molar flow rate of TMGa and TMAl and the ratio of growth
rate of GaN and AlN epitaxial layer.
- A novel method for deposition of
metal oxide thin films, including Al2O3,
ZrO2, MnOx, and RuOx were
demonstrated where the metal-organic precursors and oxidizing agents are
delivered in liquid and supercritical CO2.
- Precursor films consisting
of
mixtures of titanium (n-butoxide)2(2-ethylhexanote)2 and barium
2-ethylhexanoate were spin coated from methyl isobutyl ketone (MIBK)
solutions and used to directly deposit patterned mixed metal oxide
dielectric pads using standard lithographic exposure tools and
methods.
- Deposition of crystalline alumina
films at lower temperatures has demonstrated marginally higher promise
with metal-organic precursor systems. These fall into three main
categories: aluminum alkoxides, alkyl compounds, and
acetylacetonates.
- LNO layers were prepared by a wet
chemical method from metal-organic precursors on Si and Al2O3
substrates.
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General
Information
- About
Metal-Organic-Precursor
- Metal-organic precursors and other LED
materials
Consultant
- Consultant from America
- Consultant from UK
- Consultant from USA
- Consultant from Assam
- Consultant from England
- Consultant from New York
Process
- Incorporation efficiency of
metalorganic precursors
- Metal Oxide Thin Films Deposited
from Metal Organic Precursors
in Supercritical CO2 Solutions
- Reactive decomposition of metals in
supercritical fluids: Investigation of the solubility and
decomposability of metal organic substances
- Recent Trends in the Selection of
Metal-Organic Precursors for MOCVD Process
- Metal Organic Chemical Vapour Deposition at CNR - ICTIMA
in Pauda
- Surface-Selective Deposition of Palladium and Silver Films
from Metal-Organic Precursors: A Novel Metal-Organic Chemical Vapor
Deposition Redox
Transmetalation Process
- Organometallics Process
Uses
- Use of photosensitive Metal-Organic
Precursors to deposit metal-oxides for thin-film capacitor
applications.
- CVD of titanium oxide coatings:
Comparative evaluation of thermal and plasma assisted processes.
- High Purity Metalorganic Precursors
for CPV device fabrication.
- Morphology and High-temperature
Stability of an
Amorphous Alumina Coating Deposited by Metal Organic
Chemical Vapor Deposition on
Various Substrates.
- MEMS Capacitive Switch Fabrication
using Photodefinable Metal Oxide Dielectrics.
- Overview of Chemical Vapour
Deposition
Technology
- Metalorganic Atomic Layer
Deposition of TiN Thin Films Using TDMAT and NH3
- Development of CVD, Metal-Organic
Precursors and patterning techniques for high Tc application
- Electrical properties of
?Pb,La?TiO3 thin films deposited by low pressure metal-organic chemical
vapor deposition using solid delivery system
- LNO bottom electrodes for
spintronics on Si and Al2O3 substrates prepared by spin coating
technique using metal-organic precursors
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Company Profiles
- Company from Massachusetts
- Company from Pennsylvania
- Company from USA
- Company from England
Product
- Trimethylaluminum
- Metal Organics Precursors Product
List
- Diisopropyltelluride
MSDS
- Bis(cyclopentadienyl)
Magnesium
- Carbon Tetrabromide
- Diethyltelluride
- Diethylzinc
- Dimethylzinc
- Triethylgallium
- Trimethylaluminum
- Trimethylantimony
- Trimethylarsenic
- Trimethylgallium
- Trimethylindium
Patent
- Method for preventing metalorganic
precursor penetration into porous dielectrics
- In-situ monitoring and feedback
control of metalorganic precursor delivery.
- Metalorganic decomposition
deposition of thin conductive films on integrated circuits using
reducing ambient.
- Method of forming a
tantalum-containing layer from a metalorganic precursor.
- Organometallic precursor
compounds
Report
- Metal-organic chemical vapor
deposition and nanoscale characterization of zirconium oxide thin
films
- Issues Associated with the
Metalorganic Chemical Vapor Deposition of ScGaN and YGaN Alloys
- Submicron Structures from
Organometallic Precursors
- A study on the real-time
decomposition monitoring of a metal organic precursor for metal organic
chemical vapor
deposition processes
- Measuring the critical thickness of
thin metalorganic precursor films
- Metalorganic Precursors and
exceptional customer support
Raw Material
Suppliers
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Suppliers
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Equipment
Suppliers
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- High vacuum systems
Suppliers
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- Fuel Equipment suppliers
- Water equipment Suppliers
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